Metallic Nanomesh
A transparent flexible nanomesh having at least one conductive element and sheet resistance less than 3002 / (when stretched to a strain of 200 % in at least one direction. The nanomesh is formed by depositing a sacrificial film, depositing, etching, and oxidizing a first metal layer on the film, etching the sacrificial film, depositing a second metal layer, and removing the first metal layer to form a nanomesh on the substrate.
App Type | Case No. | Country | Patent/Publication No. | |
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Inquire | National Phase | 2013022 | United States | 9,899,117 |