Metallic Nanomesh

A transparent flexible nanomesh having at least one conductive element and sheet resistance less than 3002 / (when stretched to a strain of 200 % in at least one direction. The nanomesh is formed by depositing a sacrificial film, depositing, etching, and oxidizing a first metal layer on the film, etching the sacrificial film, depositing a second metal layer, and removing the first metal layer to form a nanomesh on the substrate.

App TypeCase No.CountryPatent/Publication No.
InquireNational Phase2013022United States9,899,117