Generating coherent deep-ultraviolet (DUV) light(~ < 200nm) - a necessity for atto-second pulse generation, advanced instrument development and photolithography advancement - may be accomplished through nonlinear optical (NLO) materials. That is, the cascaded frequency conversion - 6th harmonic generation of 1064nm radiation (Nd:YAG), 177.3nm. The following attributes are necessary for a material to have DUV NLO applications - (i) crystallographic non-centrosymmetric (NCS) structure, (ii) large transparency window, i.e. wide band gap, (iii) large second-harmonic generating (SHG) coefficient, (iv) moderate birefringence, (v) chemically stable with a large damage threshold, and (vi) easy growth of large (cm3 ) single crystals. DUV NLO materials are of great interest, and a host of compounds have been recently reported. KBe2B03F2 (KBBF) is the only material where DUV NLO behavior has been demonstrated, i.e. coherent 177 .3 light. Owing to the layering tendencies of KBBF, single crystals no larger than 4mm have been grown. In addition, the need for highly toxic BeO during the synthesis and crystal growth greatly limits KBBF's academic and commercial use. We have synthesized and characterized a new deep-UV NLO material that does not contain beryllium - Ba3ZnB5P014 (BZBP).