Herein, we show the unidirectional alignment of vertically oriented lamellar block copolymers over wafer-scale large areas for sub-10 nm patterning and hybrid nanostructures using soft-shear induced by an elastomer top layer during the thermal gradient-based annealing. This work paves the way for block copolymers to be used as independent lithographic templates for next-generation electronic devices. The block copolymer-based lithography would be an advancement over traditional optical lithography in terms of minimum feature size, ease of fabrication, and much lower cost. Furthermore, we show the use of aligned block copolymers to create large-area aligned gold nanorods with tunable dimensions by a solution-phase metal infiltration technique. These all aligned gold nanorods would be highly useful for flexible electronic devices, photonics, and plasmonic materials. Additionally, we shear align the block copolymer-polymer grafted nanoparticle blends to create hybrid metallic nanowire-dielectric nanoparticle nanostructures by metal infiltration and etching the blend films. These hybrid nanostructures show unique plasmonic properties.